Used CANON / ANELVA FC-3100 #9292992 for sale

CANON / ANELVA FC-3100 is an advanced vertical electrochemical etching reactor designed specifically for high-throughput photoresist etching processes. This equipment is designed to provide users with high endpoint accuracy and critical uniformity gap coverage. The system includes a full array of features to meet the high-precision needs of both MEMs and integrated circuit manufacturing. CANON FC-3100 has an electrochemical etching unit in which a platinized titanium anode and a stainless steel cathode are placed into a platinized titanium distributor plate. The anode and cathode are connected to a DC power source, allowing for an electric current to be passed between them. Controlling the current density, exposure, and electrolyte composition allows users to accurately etch into thick photoresist layers. ANELVA FC-3100 includes a high throughput quartz reactor for efficient etching. This reactor can accommodate up to four 150mm wafers at once, allowing for high yield production. The reactor chamber is designed to maintain process conditions with excellent temperature control, resulting in uniform etching of all wafers. The machine also features integrated process monitoring and control capabilities. This includes an inert gas injection tool and computer-controlled data logging which allows users to optimize their process and maintain excellent critical gap coverage. Overall, FC-3100 is an advanced vertical electrochemical etching reactor with a range of features to help users achieve high throughput, precision etching processes. It is equipped with an efficient quartz reactor, inert gas injection control, computer-controlled data logging, and process monitoring capabilities, allowing users to achieve high endpoint accuracy and critical uniformity gap coverage throughout the etching process.