Used CANON / ANELVA FC 7100 #9293805 for sale

CANON / ANELVA FC 7100 is a high-quality reactive ion etcher (RIE) typically used in the physical vapor deposition (PVD) and chemical vapor deposition (CVD) processes. The reactor is designed for highly accurate and precise control of the etching process, allowing for optimal control and uniformity of surface quality. It consists of a tubular chamber, which is connected to a rotary pulse valve that enables good turning of the gas mixtures for accurate application of the etching agent. The chamber is pressurized with nitrogen, allowing for enhanced control of the environment and conditions inside. The vacuum pressure is maintained by a robust turbo-molecular pump, which also provides intense acceleration of the charged particles, boosting the etching velocity and providing a smooth etching process. Additionally, a self-generated low-pressure chemical vapor compositor is integrated into the chamber, providing a continuous supply of reactive species throughout the etching process, allowing for precise and accurate control of the etch rate. The etching plasma is created by a high density 13.56 MHz RF generator that provides a stable plasma between 0.2 and 2 Torr, depending on the gas mixtures used. The RF generator is fed by a high-power solid-state power supply with adjustable output level between 0 and 1000 W. Adequate power input ensures even etching, thus providing a uniform etching surface quality. A modern microprocessor-controlled voltage and frequency regulation systems guarantee a smooth etching process. An advanced reaction chamber design allows a wide variety of etching parameters and gas mixtures such as O2, BCl3, Cl2, CF4, CHF3, NF3, and Ar. In order to secure a homogeneous etching over the entire sample, the chamber is equipped with a low-pressure device that ensures the same etching rate regardless of the sample surface area. CANON FC 7100 is suitable for a wide range of materials, including but not limited to silicon, metals, nitrides, oxides, photoresist, and diamond-like carbon. ANELVA FC7100 is a powerful and reliable reactor with a reliable performance that can be tailored to fit a variety of etching requirements, providing a top quality surface quality. With its combination of advanced RF generation technology, high-power solid-state power supply, and various other features, ANELVA FC 7100 ensures high-efficiency etching and precise control of the etching process. It is an economically efficient solution for everyday etching needs that require consistent and high-quality results.