Used CANON / ANELVA FC 7100 #9383066 for sale

CANON / ANELVA FC 7100 is a microfabrication reactor used in the silicon processing industries, typically semiconductor and optoelectronic applications. The system combines an electron beam evaporator, focused ion beam (FIB) etching, and chemical vapor deposition (CVD) processes into one highly automated and easy to use tool, making it ideal for a variety of complex fabrication tasks. The system utilizes a high-powered electron column to evaporate material onto the surface of the substrate. The electron beam is focused and provides precise control of material deposition. This process can be used to deposit thin films of metals onto a substrate to create interconnects, or wires, on a chip. CANON FC 7100 is also able to deposit multiple layers of materials onto a substrate in order to create a 3D structure. ANELVA FC7100 also provides focused ion beam (FIB) etching capabilities for the fabrication of finer structures. This process is ideal for making a variety of patterns on the surface of the substrate. The FIB process uses a charged ion beam to etch away material from the surface of the substrate. This can be used to create nanostructures, or patterns, on a chip surface. Finally, CANON FC7100 system also offers chemical vapor deposition (CVD) capabilities. CVD is a process used to deposit thin films of materials onto a substrate. This process is used in memory devices, amongst other applications. FC7100 allows for a precise and highly controlled deposition of materials onto the substrate. This added layer of precision ensures that CVD process is successful. In summary, FC 7100 microfabrication reactor is a powerful and reliable tool for the fabrication of complex semiconductor and optoelectronic devices. It combines electron beam evaporator, FIB etching, and CVD capabilities for a single-tool approach that ensures the high-precision material deposition and etching needed for a successful fabrication process.