Used CANON / QUESTER APT 4800 #9251318 for sale

CANON / QUESTER APT 4800 is an advanced production tool used in the production of semiconductors and flat panel displays. This reactor is equipped with both a freeze-frame laser beam sputtering deposition/etching process as well as a pulsed-laser thermal annealing process. It offers unparalleled accuracy, precision, throughput, and scalability. CANON APT 4800's laser beam sputtering deposition process utilizes a focused laser beam and is ideal for manufacturing highly uniform films and layers of dielectric, metal-metal, and metal-oxide materials on surfaces. It can deposit films with thicknesses ranging from 0.5 to 100 microns. The laser beam mixes the gasses and ions when producing multi-layer films. This allows for superior film quality and homogeneity in comparison to traditional sputtering methods. QUESTER APT 4800's pulsed laser thermal annealing process has a wide range of chamber pressures and temperatures to ensure levels of uniformity and repeatability previously unattainable with conventional annealing systems. This process also offers superior performance in the production of crystalline compounds and can be used to create highly conductive and high-quality films with excellent reproducibility. APT 4800 is a versatile production tool. It can rapidly deposit thin and thick layers onto substrates with a high degree of uniformity and repeatability, while providing a superior quality of films. Additionally, its capability to adjust parameters between processes results in cost-effective production. Furthermore, its ability to produce advanced thin-film structures with complex optical and electrical properties makes it an ideal tool for advanced display and diode fabrication.