Used CSD EPITAXY EpiPro 5000 #9068399 for sale

CSD EPITAXY EpiPro 5000 is an epitaxial deposition equipment designed for the production of semiconductor structures for optoelectronics, advanced materials, and high-performance integrated circuits. The system is a single-chamber, discrete epitaxial deposition reactor designed to provide high-precision control over all parameters related to epitaxial growth. It utilizes an electron-beam-assisted growth technique that combines thermal and plasma-enhanced chemical vapor deposition (EBE-CEV) to achieve excellent uniformity and quality. The unit is capable of depositing materials on substrates up to 200mm in diameter and up to 250mm in thickness. The EBE-CEV technique employed by EpiPro 5000 is designed to produce epitaxial layers of high purity with excellent controlling of layer thickness and doping concentrations. The electron beam used in the machine is ultra-rigid, allowing for very precise control over layer thickness and doping concentration, while the high-order spectrochemical analytics allow for near-saturation level control of impurity detection. Additionally, the arbitrary scanning pattern of the beam ensures uniform deposition across the maximum substrate size, allowing for improved scaling of fabrication processes. CSD EPITAXY EpiPro 5000 also offers several additional layers of sophisticated process control to ensure the highest degree of uniformity and quality. This includes advanced deposition-chamber monitoring via an in-situ spectrometer to detect gases within deposition chamber, as well as a camera assembly to monitor growth in real-time and inspect for defects and contaminants. The tool also incorporates several ventilation control systems to ensure deposition chamber is kept at the optimum temperature and pressure. Heat is another important factor when it comes to epitaxial deposition and EpiPro 5000 is designed to address this by incorporating high-performance pyronometers and water cooling systems designed to keep the substrate and deposition chamber an acceptable operational temperature. Additionally, the asset is equipped with an inert gas-flow model to ensure uniformity throughout the deposition chamber and minimize gas-flow turbulence. CSD EPITAXY EpiPro 5000 offers automated monitoring and parameter control as well, allowing scientists to experiment with difficult processes at an advanced rate. The equipment is also extremely reliable and provides a long life-time when used properly. In sum, EpiPro 5000 is a highly-advanced and reliable deposition system designed to produce high-quality and uniform epitaxial layer with excellent control and precision.