Used KOREA VACUUM TECH KVCVD-2006L #293654718 for sale

KOREA VACUUM TECH KVCVD-2006L is an advanced chemical vapor deposition (CVD) reactor designed for use in research and production. This is a multi-functional, highly efficient equipment that is suitable for a range of deposition processes and materials. It features a horizontal rectangular quartz reaction tube with a typical vacuum pressure of 10-2 to 10-5 torr. The system is divided into two sections; one vacuum chamber and one gas distribution unit. The vacuum chamber houses the reaction tube which is made of durably sealed quartz glass walls. This ensures a high level of optical transmission for monitoring during experimental runs. The reaction tube is designed to be highly energy efficient and has a large effective area with wall insulation so that the unit can achieve higher throughputs. The gas distribution unit is equipped with a set of gas flow valves and regulators in order to ensure the precise delivery of desired sets of precursors during CVD process. It is also outfitted with a quadrupole mass spectrometer, enabling real-time monitoring of the gases introduced into the reactor. The reactor is further automated with a microcontroller and several temperature and pressure sensors and monitors to regulate temperature and pressure levels within the reaction tube. KVCVD-2006L has several unique advantages over other CVD deposition systems. It is easy to operate, requires minimal maintenance, and is able to handle various deposition processes. In addition, by utilizing the fast reacting precision of the quadrupole mass spectrometer, researchers are able to accurately monitor the composition of gases used in CVD process. Furthermore, the reactor chamber is insulated for improved uniformity and reproducibility of the deposition process. Overall, KOREA VACUUM TECH KVCVD-2006L is an advanced CVD reactor that offers a number of features that make it suitable for a range of deposition techniques and materials. The machine's large reaction tube area allows for fast, efficient processing times, while the quadrupole mass spectrometer and accompanying sensors provide accurate monitoring of precursors for precise control of materials deposited. The reactor also offers easy operation and minimal maintenance and is an ideal setup for CVD deposition.