Used LAM RESEARCH 839-019090-632 #293662521 for sale

LAM RESEARCH 839-019090-632 is a type of plasma etching reactor used in the semiconductor industry for atomic deposition. It consists of a cylindrical chamber with two electrodes inside, a lower electrode and an upper electrode, separated by a small gap. The chamber is filled with a gas mixture, typically including Argon, Oxygen, and Nitrogen and is evacuated to a low pressure. Between the two electrodes an RF power is applied, initiating a plasma between the two. This created plasma will bombardment the chamber walls, cause etching and deposition of atoms, ultimately changing the layer and structure of the material inside the chamber. The system has the ability to process a variety of different wafers sizes ranging from 300 mm to 150 mm and offers a wide variety of process options. The reactor also comes with two loadlocks, one chiller and 150 mm to 300 mm capabilities. It is equipped with a high frequency RF generator and power supplies, advanced diagnostics, advanced power control and a variety of sensors. The advanced diagnostics offers tools that allow for precise control of the plasma parameters. The reactor is designed with performance and reliability in mind and is customizable to fit different user requirements. The chamber is made of stainless steel and is designed with the highest safety standards in mind. The electrodes are constructed from tungsten aluminate and resilient to plasma bombardment. The reactor also features advanced process control, meaning that it is able to self-adjust to optimize and repeatably deliver a tight window of process parameters. 839-019090-632 is a versatile and powerful reactor, ideally suited for both R&D and production etching. Its advanced process control ensures a repeatable process, precise control of the plasma parameters, and ultimately high yields. It is also compatible with state-of-the-art safety and quality standards and ensures reliability and performance in a wide variety of applications.