Used LAM RESEARCH 839-101612-883 #293671997 for sale
URL successfully copied!
LAM RESEARCH 839-101612-883 Reactor is a reliable, hi-tech etching tool designed to provide advanced plasma etching solutions for today's industrial research needs. Its high-tech design combines an exceptionally robust structure combined with a superior plasma environment to deliver precise etched results in a wide range of settings. The reactor comes equipped with several features that make it ideal for use in advanced etching processes. For instance, its compact design allows for easier handling and placement of the system in a laboratory or industrial environment. Its advanced software package provides fully automated control of etch parameters, and its high frequency output ensures precision etching. The high frequency output also ensures higher resolution etch products, making it an excellent choice for applications such as plating, coating, and microfabrication. In addition, 839-101612-883 comes with a high-efficiency electron cyclotron resonance (ECR) plasma source. The ECR source is designed to ensure an extremely uniform and high-energy plasma, creating a uniform etch for a wide range of materials. Additionally, it is powered by a high-power radio frequency (RF) antenna structure, providing more stable and efficient etch performance. LAM RESEARCH 839-101612-883 also includes a number of customizable features. It is designed with a multiple crucible system which allows for a range of different operational settings. It also includes a built-in emergency power supply to ensure continuous operation during power outages. Finally, it is constructed using advanced protective materials to ensure its durability and safe operation. Overall, 839-101612-883 Reactor is a powerful etching tool designed to deliver precise results in a wide range of settings. Its high-tech design, advanced features, and robust design make it an excellent choice for advanced etching processes and projects.
There are no reviews yet