Used LAM RESEARCH Altus Max #293610297 for sale

LAM RESEARCH Altus Max is a chemical vapor deposition (CVD) reactor designed for advanced fab transformation for advanced logic applications. With advanced process control and automation capabilities, Altus Max can process both high-dielectric-constant (high-k) and low-dielectric-constant (low-k) materials. LAM RESEARCH Altus Max incorporates the FastEx Advanced Edge™ feature, which provides superior quality and repeatability with advanced process control capabilities such as high temperature and more efficient deposition rates. This feature helps to deliver ultra-high performance materials, increasing scale and throughput while maximizing yield and device reliability. Altus Max also features automated wafer loading and unloading, with an ergonomic wafer jamming station and an airlock system for continuous operations. The lightweight, high-precision robot arm provides for efficient automated material transfer. LAM RESEARCH Altus Max also offers flexibility with the Process Window Management (PWM™) software. This software enables users to customize and monitor process parameters, as well as monitor and trend lot performance in real-time. It offers a range of options for control of deposition uniformity and contamination protection. Altus Max maximizes wafer throughput and utilization, featuring both High-Productivity ECP Processes and Massively Parallel CVD technologies. With its unique level of process flexibility, LAM RESEARCH Altus Max provides the ultimate in process scalability while providing superior fab transformation capabilities. In addition, Altus Max offers outstanding safety features, and is designed to meet all global safety standards. The operator interface is designed for easy navigation and intuitive navigation to help manage process parameters. LAM RESEARCH Altus Max is an industry-leading reactor, offering unprecedented levels of throughput, performance, and reliability. With its advanced process control and automated features, Altus Max provides advanced automation and control to deliver the highest levels of performance, scale, and throughput.