Used LAM RESEARCH Altus Max #293610302 for sale

LAM RESEARCH Altus Max
Manufacturer
LAM RESEARCH
Model
Altus Max
ID: 293610302
Wafer Size: 12"
Vintage: 2017
System, 12" Process: Metal 2017 vintage.
LAM RESEARCH Altus Max is a highly advanced reactor for processing semiconductor wafers used in the fabrication of a wide range of integrated circuits and devices. Altus Max offers a superior level of performance and capability, thanks to its advanced metal-organic chemical vapor deposition (MOCVD) technology. It utilizes a single source approach, meaning that a single precursor feed system delivers both source gas and carrier gas to create a more uniform and stable process. LAM RESEARCH Altus Max comes with a proprietary wafer loading tray, which allows for in-situ exchange and faster loading time. It also features a universal susceptor, which accommodates different wafer sizes and process configurations. The susceptor enables greater temperature uniformity across the entire wafer, boosting both process yield and throughput. To reduce risk and maintain high yields, Altus Max features a load-lock chamber that eliminates potential contamination brought by the manual loading. Further, its decoupled insulation serial (DIS) process control system automatically optimizes the process conditions, allowing for repeatable results with a maximum run-to-run repeatability of 3 sigma. LAM RESEARCH Altus Max offers excellent ease of use. Its intuitive graphical user interface (GUI) provides clear indication of process parameters, reducing the need for manual adjustments. In addition, it has a built-in recipe library for rapid transfer of configuration data. Built for long-term reliability, Altus Max comes with a patented automatic wafer transfer arm for secure loading and unloading. It also includes a self-diagnostic system that provides accurate maintenance and tracking of equipment performance, allowing the user to prioritize maintenance tasks to maximize uptime. LAM RESEARCH Altus Max is a state-of-the-art reactor that provides superior process and yield performance, optimal process control, and excellent ease of use and reliability. It is designed to be used in a wide range of advanced semiconductor fabrication processes, delivering high-quality results and consistent, repeatable performance.
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