Used LAM RESEARCH Altus Max #293625737 for sale

LAM RESEARCH Altus Max is an advanced and reliable inductively coupled plasma (ICP) reactor equipment designed to support a wide range of scientific and industrial applications. Featuring advanced technologies and customizable options, it can be used for processes ranging from etching, deposition, thin film growth, and passivation, to optical thin film deposition and chemical vapor deposition. Altus Max features an eChamber™, a revolutionary and essential component of the ICP reactor. This patented design allows users to select from one of three uniform power curves, allowing precise control to the plasma process. The chamber has excellent electrical separation of the processes, even with high power levels, and features a proven gas flow design for smooth and stable maintenance of the desired plasma parameters. With a large number of process gases available, the process can be easily customized to the requirements of any application. LAM RESEARCH Altus Max also includes a unique gas injection system. This patented design allows simultaneous control of multiple gases in a single run, allowing precise tuning of plasma parameters while optimizing throughput. Pressure control is also provided, to ensure precise modulation of the plasma. Altus Max is equipped with advanced monitor and control capabilities. A touch-screen display provides easy access to all process parameters, while integrated data logging and recipe management software allow precise control over process settings and parameters. The unit also includes Gas Analyzer and Mass Spectrometer capabilities, allowing precise control and analysis of the process environment. LAM RESEARCH Altus Max is an advanced, flexible and reliable ICP reactor machine. With its patented eChamber™ and Gas Injection systems, it offers a wide range of options for scientists and engineers seeking precise and repeatable process control. With its integrated monitor and control capabilities and multiple gas options, it can handle even the most difficult applications with ease.