Used LAM RESEARCH Altus Max #293804671 for sale

LAM RESEARCH Altus Max is a high-performance Plasma Enhanced Chemical Vapor Deposition (PECVD) reactor designed for advanced materials deposition applications. It is suitable for a wide range of processes, including high deposition rates and ultra-thin layers of up to 5 nm thickness. The equipment features an advanced source design, with independent gas flow, pressure and temperature control for multiple gases. Advanced process control enables three-dimensional uniformity for demanding thin-film applications. Altus Max offers integrated hardware and software capabilities for optimized process control. It features a large linerload for maximum uptime, max Tempo™ software for fast process analysis, and a modular architecture for flexible system control. The unit also includes an inno@mapper™ C1 controller with an integrated media source, and various levels of integration for process control and measurement. LAM RESEARCH Altus Max is built to the highest safety standards, and the machine includes multiple safety features, such as pressure and temperature monitoring, automatic shutdowns, and a combustible gas detector. The tool is designed to deliver reliable process control with minimized downtime and maintenance. Altus Max offers a choice of aftermarket modules, including an optional robotics solution for improved efficiency and redundancy, an ionization gauge for real-time process control and a large chamber for small feature sizes. It is also available with a variety of source and substrate configurations, including both single- and multi-chamber systems, to meet specific applications needs. LAM RESEARCH Altus Max is also designed with a modular architecture that ranges from a single chamber to a four-chamber asset. Through its integrated software, the model provides fast, accurate and stable control of process parameters, which is essential for achieving consistent product performance. The integrated software also allows for data logging, process optimization, and automated recipes. Overall, Altus Max is a reliable, user-friendly PECVD reactor designed for high-profile advanced materials deposition applications. Its advanced source design, fast process control, integrated automated software and a wide range of aftermarket modules make it an ideal choice for many industries.