Used LAM RESEARCH Altus #293818161 for sale

LAM RESEARCH Altus is a high-efficiency reactor designed for quality uniformity in the deposition of thin films. It features an auto-mechanical platform design that optimizes the distribution of etchants and gases, achieving repeatable results. Altus is designed to be modular, allowing for the addition of additional modules depending on the production needs of the application. It also has an integrated robot arm for precise and accurate loading/unloading of substrates. LAM RESEARCH Altus reactor is capable of a wide range of processes, including thermal and plasma processes such as chemical vapor deposition (CVD), plasma-enhanced CVD (PECVD), physical vapor deposition (PVD), physical vapor vapor deposition (PVPD), and electrochemical deposition (ECD). Its unique design and features enable it to provide high precision and uniformity in substrate etching. Altus reactor has a wide range of parameters that can be adjusted to accommodate different process needs. It utilizes sophisticated software to precisely control the operating parameters for each process. It also includes an onboard safety equipment to protect the user from potential hazards. The reactor is made up of an anode section and a cathode section. The anode section consists of an electrically conductive plate that contains chemical precursors for deposition. The cathode section contains electrodes that generate a plasma source that bombs the anode section to initiate the deposition process. LAM RESEARCH Altus reactor also includes a chemical delivery system and a rapid reaction unit. The chemical delivery machine supplies the correct reactive gases for the process while the rapid reaction tool increases the process speed. Together, these systems enable higher throughput and shorter cycle times. Finally, Altus reactor is also designed with in-situ monitoring capabilities, allowing it to monitor any changes in the chemistry or reaction parameters, enabling it to compensate accordingly. This feature helps to ensure that the process is held to the tightest tolerances, ensuring that high-quality uniformity and repeatability are consistently achieved.