Used LAM RESEARCH Altus #9163188 for sale

LAM RESEARCH Altus is an advanced, compact reactor equipment designed for a variety of modern semiconductor processing needs. In particular, Altus is ideally suited for high-volume, epitaxial and low-pressure chemical vapor deposition (CVD) applications. LAM RESEARCH Altus reactor is built to handle massive throughput with a wide range of precise temperature control and precise reaction time capabilities. Its design is based on an enclosed high purity quartz tube with a lumped resistance heating element, a fully programmable and configurable powder feeder, and precise reactant control via integrated mass flow controllers and valves. With precise temperature control, high purity vacuum, and precise reactant control, Altus reactor system is able to provide highly accurate and repeatable results. LAM RESEARCH Altus reactor unit achieves high precision in a wide range of process conditions due to its advanced thermal design which features end-to-end variable heating capabilites, multiple high purity purity quartz refrigeration points, and multiple protective metallic layers. The advanced temperature control allows for rapid changeover times between different recipes and process requirements, while providing excellent temperature uniformity throughout the machine. The tool also comes with automated pressure control to ensure accurate responses from the asset. This, combined with the fully programmable reactant control, allows for repeatable results with minimal variations. Altus reactor model is extremely versatile and can be integrated with a variety of other components for a comprehensive CVD equipment. The system is compatible with multiple gases, chemicals and materials, and can be configured for handling either vertical or parallel process runs. The reactor also offers integrated metrology tools for process monitoring, particle sizing, and surface characterization, as well as customizable controls for automating and optimizing the processing operations. To ensure a safe and reliable operation, LAM RESEARCH Altus reactor unit is built with high-grade stainless steel and exotic metals, ensuring maximum structural integrity. The machine is also backed by an array of safety features, such as inert gas filling and purging, over-temperature protection, and high-voltage protection. The tool is also ATEX approved and complies with regulations set forth by IEC6116 and other international guidelines. Overall, Altus reactor asset is an advanced, high-performance platform for CVD and epitaxial deposition, offering unparalleled precision and repeatability in a range of process conditions. With it, users are able to achieve excellent control throughout their processing tasks, ensuring uniform consistency with each batch of product.