Used LAM RESEARCH C3 Ice mod #293659339 for sale

Manufacturer
LAM RESEARCH
Model
C3 Ice mod
ID: 293659339
Vintage: 2016
System 2016 vintage.
LAM RESEARCH C3 Ice mod is a high efficiency, low cost plasma etching reactor capable of precise etching of thin-film and metallic materials. It is a compact and cost-effective equipment that has been designed for use in the fabrication of semiconductors and other electronics. The power supplies of C3 Ice mod are capable of generating up to 650°C high temperature plasmas, making it ideal for high temperature annealing, precision metal etching and anodic film deposition. The system consists of four components which are the Modular Interface Controller (MIC), Mainframe, Modular Power Supply (MPS) and two Ion Source Control Units (ISC). The MIC is the central processing unit responsible for the overall control and automation of the unit. It is responsible for controlling and monitoring all machine parameters such as process temperature, pressure, gas flow and pressure, and power supply adjustments. The mainframe contains the chamber components, vacuum pumps, cooling subsystems, safety systems, and ion beam sources, etc. The MPS is responsible for the generation of the low voltage, high temperature plasma for the etching process. The ISC unit is responsible for the generation of high-current plasma beams and the cooling of the substrates. LAM RESEARCH C3 Ice mod is equipped with two vacuum chambers and can accommodate up to six substrates. The tool is compatible with a variety of etch gas chemistries such as oxygen, argon, nitrogen, and chlorine. It is capable of controlling the etch depths and depths of features with a precision of 1 micron. C3 Ice mod has an automated gas delivery asset for the precise control of etch gas flows. It also has an adjustable RF generator for precise control of plasma parameters, such as pressure, temperature, and ion beam acceleration. LAM RESEARCH C3 Ice mod is also equipped with a range of diagnostic instruments such as optical emission spectroscopy and mass spectrometry. This allows for the accurate determination of etching rates, etching depth, substrate thickness, film adhesion, electrical characteristics, and other process parameters. C3 Ice mod is highly efficient and cost effective and provides excellent repeatability and accuracy in the production of high-end semiconductor devices.
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