Used LAM RESEARCH Dual Sola Excel #9316183 for sale

LAM RESEARCH Dual Sola Excel is a highly efficient, optimized thermal reaction hot-wall reactor designed for etching and deposition processes. It is a two chamber reactor with one chamber dedicated to etching and the other to deposition. The chambers are separated by a triple walled ceramic chamber housing a thin film source. This ensures maximum efficiency by eliminating direct contact between the source and the process chamber. The reaction chamber is covered by a highly reflective stainless steel conformal shield for maximum efficiency. The reaction chamber also has an anode and cathode for the plasma chamber and a provision for introducing dopants and etchant gases. The process vessel is agitated by magnetic stirrers with frequency control to ensure uniformity of the process. The process vessel has a built-in gas evacuation system that enables the evacuation of the process vessel before and after the process. Dual Sola Excel is designed for high throughput etching and deposition process for high production levels with low etch-back. It is perfect for etching and depositing thin films of silicon dioxide and other materials in semiconductor manufacturing processes. The dual-chamber enables efficient process management so that the right etching or deposition process is maintained. The heating system ensures uniform temperature throughout the thermal reaction chamber. The thermal reactor is enclosed by a precision temperature control system ensuring the temperature is consistent in the reaction chamber. It can also be remotely monitored, allowing excellent control and convenience. LAM RESEARCH Dual Sola Excel also features an integrated RF generator, allowing various etching and deposition processes to be carried out using the generator. The refrigerator is nitrogen-pressurized and allows a temperature range of -60 to 120 degrees Celsius. It can also be used for metal evaporation with a precise humidity and temperature control. Overall, Dual Sola Excel is an efficient and precise thermal role reactor for etching and deposition processes in the semiconductor industry. It enables users to accurately monitor and control the process, ensuring consistent, optimal process results. It is also suitable for metal evaporation and can work with a wide range of materials.