Used LAM RESEARCH / NOVELLUS Altus extremefill #293625748 for sale

LAM RESEARCH / NOVELLUS Altus extremefill reactor is an advanced plasma etch process for the creation of source/drain structures used in the fabrication of ultra-shrunk transistors and MOSFETs. The reactor uses a combination of gases such as CF4, CHF3, and Helium and uses argon as a pre-cleaning agent to etch metals. This mixture of gases and the argon pre-cleaning agent forms an isotropic etch environment that enables tight control of the fin profile over a wide temperature range. The reactor utilizes high density plasma to provide superior etching performance and increased throughput. This is accomplished by providing a high plasma density with superior etch uniformity. NOVELLUS Altus extremefill reactor also takes advantage of a unique gas delivery equipment to ensure uniform gas distribution throughout the etch chamber. This feature, in combination with NOVELLUS Advanced Process Control software, allows for precise control of the etching process. LAM RESEARCH Altus extremefill reactor also features Miniature Source/Drain Technology (MDT). This technology enables the creation of Source/Drain structures with depths of ½ to 8 microns, providing a more tightly controlled fin profile with superior depth control and improved power efficiency. This technology also allows for increased device uniformity by eliminating hot spots in the source/drain structures. Altus extremefill reactor also offers state-of-the-art process control through its embedded Digital Intelligent Supervision and Process Control (DIPC) system. This unit provides advanced monitoring, diagnostics, and tuning to ensure optimal performance. The machine also helps to reduce product cycle times and improves yield and process repeatability. In conclusion, LAM RESEARCH / NOVELLUS Altus extremefill reactor is an advanced plasma etch process for the creation of ultra-shrunk transistors and MOSFETs. It utilizes a high density plasma to provide superior etching performance and increased throughput, while also offering cutting edge process control features such as Miniature Source/Drain Technology and Digital Intelligent Supervision and Process Control.