Used LAM RESEARCH / NOVELLUS Altus #293754401 for sale

LAM RESEARCH / NOVELLUS Altus is a next-generation physical vapor deposition (PVD) equipment designed for advanced deposition of thin films on substrates used in high-performance semiconductor applications. NOVELLUS Altus features an advanced vacuum chamber architecture designed to deliver superior performance at high chamber flux and is ideal for advanced film layers, enabling faster deposition rates and improved throughput. The system combines high throughput and low cost of ownership with low maintenance requirements. LAM RESEARCH Altus employs NOVELLUS patented "All-Around" dual reactor technology which allows for deposition from two sources simultaneously. The combination of two sources allows for faster rate of deposition compared to a single source unit, while increasing uniformity. The dual reactor also allows the user to switch between deposition on the top surface and bottom surface of the substrate without having to change the product owner or wait for re-pressurization. Altus utilizes LAM's advanced film control machine, which provides integrated feedback control of temperature, pressure, and vacuum, allowing the user to precisely control a variety of variables when depositing thin-film materials. This control tool also provides excellent control over deposition uniformity, reject rate, and root-mean-square (RMS) roughness. LAM RESEARCH / NOVELLUS Altus substrate transfer asset delivers high throughput while minimizing particle generation and contamination. It also provides repeatable, automated, vacuum-compatible, substrate flips, enabling rapid product changes. NOVELLUS Altus features several advanced safety systems, including a vacuum-friendly, high-capacity fire suppression model, and advanced electrical cabinet monitoring and control. This cabinet control also allows the user to easily monitor and restore equipment health in the event of outages or other system disturbances. In conclusion, LAM RESEARCH Altus is designed for utmost process reliability and superior performance in application-critical PVD applications, thereby providing significant cost savings. Altus is an ideal choice for high-performance PVD deposition for both prototype and production applications.