Used LAM RESEARCH / NOVELLUS Altus #9241208 for sale

LAM RESEARCH / NOVELLUS Altus is a high-end gas cluster tool (GCT) for advanced semiconductor etch applications. This tool is intended for mass production and large processing requirements. It is capable of producing complex shapes and features on a variety of substrates, including photoresist, metals, and insulators. NOVELLUS Altus GCT utilizes multiple process sources to produce high-aspect-ratio features and structures on the workpiece. The process sources include a pair of single-wafer, self-bias wafer chambers that generate individually tailored plumes of inductively coupled plasma (ICP). This allows for large etch areas without the need for additional source and gas supply systems. The self-bias wafer chambers are capable of processing multiple substrates simultaneously and can vary the power settings and gas flow rates independently for each workpiece. This allows for exact process control over the etch profile. The power and gas delivery can also be adjusted based on the material being processed and the desired etch profile. LAM RESEARCH Altus GCT also features a control and metrology equipment to ensure uniformity. A single spectrometer is employed to monitor etch species and quantify the uniformity of the process. This system uses cameras and dual-view optics to measure gas flow, chamber pressure, and etch rate. Altus GCT has a highly automated process recipe creation and validation unit for all etch layers and feature shapes. This machine ensures that the etch profile meets the desired parameters for each substrate. Finally, LAM RESEARCH / NOVELLUS Altus GCT is equipped with a user-friendly graphical user interface. This allows for easy parameter adjustment and process control. Operators can also use the GUI to monitor operating conditions and review etch results in real-time. NOVELLUS Altus is a high-end tool for advanced etch applications in the semiconductor industry. It is able to deliver superior etch results on single or multiple substrates and is designed for mass production and large processing requirements. It features a highly automated process recipe creation and validation tool, dual-view optics, spectrometry monitoring, and a user-friendly GUI.