Used LAM RESEARCH / NOVELLUS Altus #9241282 for sale

LAM RESEARCH / NOVELLUS Altus is an advanced deposition reactor used in the semiconductor manufacturing process. It is a single chamber system designed for a high throughput and precise films. The reactor is designed for the deposition of dielectrics, metals, and other materials. NOVELLUS Altus reactor utilizes an electron cyclotron resonance (ECR) technique to create its plasma, which allows for high temperature etching in a more controlled environment. The altitude of the plasma ensures that the reactants are exposed to high levels of energy, and the chamber utilizes a unique multi-mode operation that can handle both low and high-temperature processing. The single chamber design also allows for smaller wafer sizes, such as those used in photonic applications. It is capable of producing ultraclean coatings that are highly uniform and highly uniform across the wafer. The wafer temperature can be adjusted during the deposition process, allowing for greater control over the final outcome. LAM RESEARCH Altus reactor also uses intelligent process control, which allows the user to monitor and control the process parameters throughout the deposition process. This process can be used to optimize the deposition and ensure optimal uniformity of the film on the wafer. The intelligent process control also makes sure that the process is fully repeatable, with uniform films. Altus is an ideal choice for anyone looking for an advanced deposition system that offers high precision and repeatability. Its single-chamber design makes it capable of handling both low and high-temperature processes, and its intelligent process control allows for greater control over uniformity. Its ability to handle small wafer sizes makes it especially well-suited to photonic applications.