Used LAM RESEARCH / NOVELLUS Altus #9255626 for sale

LAM RESEARCH / NOVELLUS Altus is a type of PECVD reactor (Plasma Enhanced Chemical Vapor Deposition). It is a tool used to deposit thin films on to a substrate in the semiconductor industry. It is ideal for applications requiring quick process times with low temperature deposition. NOVELLUS Altus equipment uses a transverse RF driven plasma to deposit a thin film of the desired material on the substrate. The system works by introducing a reactive gas into its processing chamber. After passing through a series of exhaust filters, the gas is subjected to an electron bombardment, which causes it to break down into reactive atoms and molecules. The cell walls of the chamber are lined with highly conductive electrodes that generate an active RF field. This allows for gentle plasma micro-discharges along the length and width of the chamber, creating high energy reactive species which react with the incoming deposition gas. The deposition film produced by LAM RESEARCH Altus unit is uniform and anhydrous, with low stress and excellent adhesion. It is capable of depositing dielectric, conductive, metallic, or antimicrobial thin films on a variety of substrates. The machine has built-in temperature and pressure monitoring, with the ability to monitor the thickness of the deposition film in-situ. This ensures uniformity and repeatability in processing. The tool also features a fast ramp up time, low temperature plasma generation, and reduced processing times. The chamber is capable of reaching temperatures up to 450 C, and reaction times down to a few seconds. It is equipped with tool and recipe management software for remote control and monitoring, as well as concentration profiling capability for optimization and automation. Altus reactor asset is used widely for a variety of applications ranging from advanced packaging to MEMS devices, to advanced circuit integration. This makes it an excellent substrate for the semiconductor industry. Its low-temperature deposition capability makes it ideal for patterning and planarizing processes such as processing MEMS structures, where higher temperatures can cause thermal damage. LAM RESEARCH / NOVELLUS Altus reactor is also easily modified for different deposition requirements. Its customization capabilities make it suitable for a wide range of applications. From depositing insulators for power amplifiers to depositing protective layers for microfluidic systems, NOVELLUS Altus reactor is a versatile tool for semiconductor deposition.