Used LAM RESEARCH / NOVELLUS Altus #9261404 for sale

LAM RESEARCH / NOVELLUS Altus is a reactor used for material deposition on semiconductor substrates in the microelectronics industry. It provides efficient processes to deposit layers of materials, such as gate oxide, photoresist, polyimides, and nitrogen-rich silicon nitride, onto semiconductor substrates. NOVELLUS Altus reactor utilizes a wide array of technologies to deposit these layers, such as chemical vapor deposition (CVD), low pressure CVD (LPCVD), physical vapor deposition (PVD), and electron cyclotron resonance (ECR). The CVD process involves gas precursors that react at elevated temperatures to form uniform thin films on the surface of a substrate. The LPCVD process is a low temperature variation of CVD and is commonly used for thick or hi-k gate oxides. The PVD process involves energetic deposition of material onto the wafer from a source material in the form of a sputter target, and is typically done at low pressures. Lastly, ECR involves the use of a microwaves source to ionize the process gases, creating plasma which is then used to deposit the layer on the substrate. LAM RESEARCH Altus reactor is built with a user interface that provides seamless access to its features and settings, making it easy to customize the deposition recipes and process parameters for each layer. The reactor also has a multi-zone capability, allowing up to eight different deposition processes to run concurrently, with up to four different substrates per zone. Additionally, the vacuum source is designed to maintain the base pressure around the process chamber and deliver a fast pump down time for improved productivity. Altus reactor is an excellent choice for materials deposition on semiconductor substrates, as it provides the user with a wealth of customization and automation options for achieving reliable and uniform results. Its multi-zone capability and fast pump down time further increase process efficiency, and its user-friendly interface makes it easy to configure the reactor for optimal results.