Used LAM RESEARCH / NOVELLUS Altus #9261411 for sale

LAM RESEARCH / NOVELLUS Altus is a high-performance plasma-enhanced chemical vapor deposition (PECVD) reactor equipment used for the deposition of low temperature oxide and high temperature nitride films. It allows for the deposition of micron- and sub-micron-scale layers of various thicknesses and densities with excellent uniformity across large wafer sizes. The system is based on the standard LAMNOVELLUS PECVD process, which is a high-frequency, high-duty-cycle pulsed process configured for high throughput with millisecond-scale deposition times for oxide films and sub-millisecond cycle for nitride films. NOVELLUS Altus reactor improves on this process with its proprietary plasma-enhanced chemical vapor deposition (take-off) technology. This unit uses a unique multi-pulse regime to produce a repeatable plasma-enhanced reaction of reactants supplied from the chamber, resulting in films with excellent uniformity and outstanding conformality. LAM RESEARCH Altus reactor also features proprietary advanced plasma isolation features to maintain a stable process window over a wide range of substrates. These new isolation systems help to reduce runaway reactions and eliminate temperature variation across the wafers, resulting in better film thickness uniformity and fewer process excursions. The machine's modular design allows users to quickly change between oxide and nitride modes and to adjust gas flows and pulse parameters to modify the film characteristics. The highly versatile Altus tool also incorporates a number of options for advanced deposition monitoring, including non-contact reflectance and direct-write laser reflectance. LAM RESEARCH / NOVELLUS Altus comes with a computer-controlled environment management asset to ensure the quality and consistency of the process. Low-frequency noise is minimized through the advanced isolation systems, and the operator interface makes model operation straightforward and efficient. The equipment can be used for a wide range of applications, from MEMS to flat-panel displays, and is suitable for both tool and research applications.