Used LAM RESEARCH / NOVELLUS Altus #9261430 for sale

LAM RESEARCH / NOVELLUS Altus is a physical vapor deposition (PVD) Atom Source Reactor. The equipment is designed to provide precise control of film deposition rate, temperature, pressure, and other process conditions thereby ensuring uniform and precise coating on substrate material. It is equipped with a low-power, high-density ion source, allowing for precise deposition of thin-film layers on substrates. The system includes a high-resolution ion source, a plasma processing chamber which is used to bring the plasma and substrate together, as well as, electrical power supplies which control the processing conditions. The high-resolution source is capable of producing a high current density, enabling a controlled and uniform deposition of thin films. The plasma processing chamber, which is the heart of the unit, allows for the generation of a low-power, high-density plasma. This plasma is necessary for the precise deposition of thin films at low temperatures, resulting in low material consumption and better electrical, optical and mechanical properties. The machine also includes several technological components such as a substrate holding-ring, a heater, a cooling section and an ion-driven pre-shaping unit. The substrate holding-ring facilitates the positioning and pre-treatment of the substrate material before the PVD process begins. The heated section of the tool moves rapidly and accelerates the process of depositing the film, while the cooling section helps maintain uniform temperature throughout the PVD deposition. In addition, the pre-shaping unit, located between the substrate-holding-ring and the PVD chamber, helps create accurate layers with desired thickness and composition. The asset can process many different substrate materials such as aluminum, copper, silicon and glass. Furthermore, the model is capable of depositing many different types of materials including chromium, aluminum, titanium and tungsten. NOVELLUS Altus PVD equipment is critical for creating precise, uniform and appropriate thin-film layers for critical components of devices used in today's advanced electronics. The accurate deposition of materials onto the substrates guarantee quality parts and products, ensuring reliable and effective performance. With an abundance of technological components, the system is perfectly suited for achieving precise films throughout a wide range of temperatures and process conditions.