Used LAM RESEARCH / NOVELLUS Altus #9270871 for sale

LAM RESEARCH / NOVELLUS Altus is an advanced reactor that is used for thin film deposition. It is designed for precise, high performance thin film deposition processes, and is capable of achieving excellent process stability and repeatability. This type of reactor was designed to deposit films with thicknesses ranging from a few dozens of angstroms to several hundred angstroms for a wide array of advanced applications. NOVELLUS Altus reactor utilizes ARC technology, which stands for an Advanced, Repeatable Chamber technology. This technology optimizes the chemical environment within the chamber to provide repeatable and uniform results. It includes features such as a multi-zone temperature control, a low-pressure precursors, and a highly uniform distribution of gas deposition flux, creating the ideal environment for plasma assisted chemical vapor deposition (also known as PECVD). The main advantages of using LAM RESEARCH Altus reactor are the accuracy of the deposition process and the consistent results in both terms of film quality and thickness. The reactor also features a high-end data acquisition system, with options for real-time monitoring of process parameters such as pressure, temperature, gas composition, and deposition rate, giving the user the ability to optimize their process. Altus reactor is a versatile tool that can be used in a variety of industries and applications. Its precision and repeatability make it ideal for electronics, energy, and medical industries, where accurate thin film deposition is critical. Other applications include MEMS, energy harvesting, and wearables. LAM RESEARCH / NOVELLUS Altus reactor is a reliable and cost-effective tool that has been used in a large number of applications. Its precise and repeatable results have been used in a number of industries, ranging from electronics to medical to energy. Its robust design and reliable performance make it an excellent choice for advanced thin-film deposition processes.