Used LAM RESEARCH / NOVELLUS Altus #9270995 for sale

LAM RESEARCH / NOVELLUS Altus is a type of Inductively Coupled Plasma reactor used in the fabrication of semiconductor devices. This technology uses a toroidal plasma chamber to create and sustain a plasma. It features a thick-walled quartz chamber kept at different pressure and atmosphere. This chamber is filled with a gas mixture where electrons are excited to high energy levels and ionized, creating a plasma. This plasma is then used to deposit thin-film layers of specified materials on wafers. NOVELLUS Altus reactor utilizes a mixture of several process gases, including Argon, Oxygen, Nitrogen, Hydrogen, Sulfur Hexafluoride, and rare gases such as Helium and Xenon. These gases are introduced to the chamber at a preset flow rate for each gas. An external plasma generator creates an energetic plasma inside the chamber, heating it to temperatures typically between 500 and 1200 degrees Celsius. This plasma can activate and break down the molecules of the process gases that then react on the wafer surfaces. The wafers are biased to increase the etching reaction and material deposition on their surfaces. The main advantages of LAM RESEARCH Altus reactor over standard plasma reactors are its enhanced control and flexibility over the etching process. The controller allows the user to fine-tune the effects of the plasma by controlling the amount of each process gas, its flow rate, and the beam power. In addition, it can be easily changed to create different types of surface topology, like planarizing and 3D etching, which are needed for advanced chip designs. Finally, Altus reactor is a highly reliable and efficient tool for depositing and etching layers of material on semiconductor devices. It is also cost-effective, allowing customers to take advantage of its advanced features without breaking the bank. With its versatile design, LAM RESEARCH / NOVELLUS Altus is the ideal choice for any semiconductor fabricator.