Used LAM RESEARCH / NOVELLUS Altus #9271265 for sale

LAM RESEARCH / NOVELLUS Altus is a thermal chemical vapor deposition (CVD) reactor used in the semiconductor manufacturing process. It is designed to provide high-precision, low-temperature processes, and ultra-low-pressure operation. NOVELLUS Altus utilizes a turbofan pump to achieve superior deposition uniformity and repetition of parameters at the expense of higher power consumption. To meet thin film applications that require higher deposition rates, LAM RESEARCH Altus incorporates two thermal CVD sources using a quartz boat for reliably depositing conformal thin films. This combination of CVD sources produces a temperature range of 350°C to 575°C as well as a precision temperature control of 0.1°C. In addition, Altus features NOVELLUS patented Thin-Film Source Nozzles that are designed to generate uniformity of deposition over a wide area. Process pressures may be adjusted from 10 Torr to 1 Torr for optimal thin film results. LAM RESEARCH / NOVELLUS Altus is designed to operate over a wide range of substrates and provides the capability to deposit materials onto large-area substrates. Film deposition can be fine-tuned by variable deposition rate control and the inclusion of an adjustable bias voltage between the main source and the substrate. Its design includes a void-free voltage implantation window and is enclosed in a quartz tube for efficient vacuum control. To ensure consistent repeatability and uniformity of the processed part, NOVELLUS Altus features Linear Motor Actuators that enable precise motion of chamber accessories in both vertical and horizontal directions with a resolution of 0.5µm. In addition, LAM RESEARCH Altus includes LabVIEW Graphical Development Environment and its custom scripting languages which enables automated, accurate and repeatable process control. Altus is a reliable and efficient deposition CVD reactor that can optimally process thin film layers onto a variety of substrates. With its high-precision thermal control, ultra-low-pressure operation, and adjustable process parameters, LAM RESEARCH / NOVELLUS Altus offers manufacturers the precision and performance needed to create high-quality products.