Used LAM RESEARCH / NOVELLUS Altus #9315037 for sale

LAM RESEARCH / NOVELLUS Altus is an advanced thermal vacuum reactor designed for dielectric film application. It is comprised of a vacuum chamber, a radiation source, a chamber pressure controller, heaters, mass flow controllers, and a gas distribution equipment. The vacuum chamber provides a clean environment for the deposition and post-deposition processes. The radiation source creates the conditions necessary for the deposition process, while the chamber pressure controller regulates the pressure within the chamber. The heaters ensure the proper temperature is maintained during the deposition process and the mass flow controllers gauge the pressure to ensure the efficient use of gasses. The gas distribution system distributes nitrogen and hydrogen throughout the chamber for a uniform process. The unit also monitors the purging process of the chamber to ensure a successful deposition. NOVELLUS Altus utilizes cycle time and through-put optimization through multiple recipes and programs. It offers high-reproducibility in a cost-effective solution for dielectric film deposition. The machine is designed for high quality luminescent layer thin film deposition while minimizing contamination and defects. Additionally, the tool's optional process controller offers software-based process control and data management. LAM RESEARCH Altus is a reliable, robust, and user-friendly asset that provides advanced thermal vacuum deposition for multiple applications.