Used LAM RESEARCH / NOVELLUS Concept 2 Sequel #9251473 for sale

LAM RESEARCH / NOVELLUS Concept 2 Sequel is a high-performance, electron beam lithography (EBL) equipment that is used to create nanoscale patterns used in precision manufacturing. The system has the capacity to create extremely accurate patterns that are suitable for a wide range of processes, including semiconductor device fabrication, computer memory production, and display manufacturing. NOVELLUS Concept 2 Sequel is based on the concept of electron beam lithography (EBL), which is a process where a beam of electrons is used to precisely pattern onto a substrate. The lithography is accomplished by applying a pattern mask to the substrate and precisely moving the electron beam in the desired locations of the pattern. In LAM RESEARCH Concept 2 Sequel, the electron beam is digitally controlled by applying digital signal processing to the motion of the electron beam in order to accurately position the beam on the sample. This tight control of the beam's location, combined with the precision of the synchronized optical unit, enables Concept 2 Sequel to achieve nanoscale resolution. LAM RESEARCH / NOVELLUS Concept 2 Sequel also incorporates several features to enhance throughput and production. Features such as electron source and heating elements, beam current and energy regulation, and interlock and safety systems that prevent accidents due to excessive exposure, successfully increase the rate at which the desired patterns can be produced. NOVELLUS Concept 2 Sequel is also capable of various exposure times and pattern density control to enable the flexibility of the device to address different types of applications. Another key feature of the machine is the redundant EBL capability which enables fast switching between two different beam "heads" in order to double the tool's productivity. In addition, the asset is designed to fit a range of cleanroom facilities, and it can be easily integrated with other production systems in order to maximize efficiency. Overall, LAM RESEARCH Concept 2 Sequel is a highly reliable and versatile EBL model that is capable of fabricating nanoscale patterns with accuracy and precision. It is an essential tool for any facility that requires a high-performance, high-precision technology for semiconductor device fabrication and other electronic production.