Used LAM RESEARCH / NOVELLUS Concept 2 Sequel #9251475 for sale

LAM RESEARCH / NOVELLUS Concept 2 Sequel is a reactor used for chemical vapor deposition (CVD) for semiconductor manufacturing. It consists of two main components: the process chamber and the remote maintenance module (RMM). The process chamber is the main processing unit, which is designed to optimize the deposition of the desired material onto a substrate. The RMM is the part of the equipment responsible for maintenance, including cleaning and calibrating the process chamber. The process chamber features a single-wafer, quartz showerhead, and gas distribution plate. The quartz showerhead offers uniform gas distribution, allowing for uniform deposition of material onto the substrate. The gas distribution plate enables precise supply of the desired gases to the source side of the process chamber. This allows for control over the concentration of the source gas and the homogeneity of the reaction atmosphere. NOVELLUS Concept 2 Sequel also features two different uniformity control systems. The first system is the process temperature uniformity unit (PTUS), which is used to monitor and adjust the temperature of the process chamber during CVD growth. The second machine is the gas uniformity tool (GUS), which is used to control the delivery of the source gas and to achieve precise gas homogeneity. The RMM of LAM RESEARCH Concept 2 Sequel includes a series of automated maintenance functions such as isolation valve monitoring, pressure control management, and pump speed regulation. These maintenance functions allow for improved process control and reliability. The RMM is also equipped with an integrated turbo molecular pump, which is used to maintain low process chamber pressure. Concept 2 Sequel comes in two different sizes, the G2 and the G3. Both reactors are designed to produce the high-quality materials necessary for the semiconductor industry. They also feature advanced automation and integrated gas delivery systems that enable precise, repeatable processing. LAM RESEARCH / NOVELLUS Concept 2 Sequel can be used for a variety of CVD applications such as epitaxy, deposition of metals, oxides, and nitrides.