Used LAM RESEARCH / NOVELLUS Concept 3 Altus Max #293618240 for sale
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LAM RESEARCH / NOVELLUS Altus Vector Reactor (AVR) is an advanced tool for the deposition of thin films and the etch of non-soc substrates. It is a high-capacity, high-performance reactor which provides precise, fast, and highly repeatable processing. It is capable of etching substrates with a resolution of one micron, allowing for increased densities and smaller feature sizes. The AVR utilizes an automated, continuous vacuum process that is based on physical vapor deposition (PVD), chemical vapor deposition (CVD), electron beam induced etching (EBID), and electrochemical plating (ECP). This unique combination of techniques provides enhanced uniformity and control in materials deposition and etching processes. The combination of PVD and CVD processes helps in reducing undesirable oxidized compounds, and allows for the deposition of complex multi-layer structures with high uniformity and accuracy. The ECP process enables electrochemical plating of materials with high resolution and speed. This process is commonly used for integrated-circuit level features or MEMs-level features. Lastly, the EBID process is used for etching materials with superior morphological control and uniformity, and allows for high reliability and precision of etched features. The AVR has a universal platform for wafer handling and process delivery, making it an ideal tool for multiple applications. It utilizes advanced vacuum technologies and auxiliary processes, such as inert and reactive gas purging, to provide a clean process environment and lower contamination. The single-wafer cassette handling system allows for precise placement of multiple "golden" pieces which are used to perform real-time process control. In addition, the AVR has a wide range of recipes available to facilitate the production of sophisticated structures with precise etching, precise repeatability and precise control of etching rates, uniformity, and feature size. Overall, the AVR provides a reliable and precise process for etching and deposition of thin films. Its combination of advanced processes, precise wafer handling, and versatile recipe designs make it an excellent tool for various applications, from MEMs to large-scale processing.
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