Used LAM RESEARCH / NOVELLUS Concept 3 Altus Max #293650146 for sale

ID: 293650146
Wafer Size: 12"
Vintage: 2014
CVD System, 12" 2014 vintage.
LAM RESEARCH / NOVELLUS Concept 3 Altus Max is an Atomic Layer Deposition (ALD) tool designed to enable process engineers to achieve the high-quality results required for advanced device manufacturing. The Altus Max tool is designed for high productivity and low cost-of-ownership due to its innovative design and full automation capabilities. The Altus Max is a process chamber which contains a vacuum and deposition driver. The chamber holds up to two reactors, and is capable of running multiple chambers simultaneously. The system also has full robot automation, which enables modular exchange of chambers, wafers and components without interruption of the production cycle. The Altus Max system's main feature is its ability to deposit high quality thin films using ALD. This sophisticated process involves a sequential layering of two separate precursors on the wafer surface. The precursors can be either self-assembling monolayers (SAMs) or vaporised vaporised precursors. The software developed for the tool enables layer-by-layer accuracy and repeatable process performance. The ALD process employed by the Altus Max is extremely versatile and can be tailored to meet the technological needs of a variety of applications such as advanced packaging, memory devices and MEMS components. The production rates achieved with the tool range between 30-1000 wafers/hour, allowing the easy scaling up of production volume. The Altus Max is a reliable tool, with a proven track record of reliable process results. The software features a user-friendly interface and full reporting capabilities, and all components are designed for an extended lifetime with minimal maintenance, thus delivering a low cost-of-ownership, even for high-volume production. The Altus Max represents a powerful and reliable tool in NOVELLUS line-up, designed to ensure high-quality results and repeatable process performance, both for research and production applications. It offers a reliable, cost-effective way to manufacture advanced devices, with a true return on investment.
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