Used LAM RESEARCH / NOVELLUS Concept 3 Vector Express #9241174 for sale

LAM RESEARCH / NOVELLUS Concept 3 Vector Express
ID: 9241174
Wafer Size: 12"
Vintage: 2007
System, 12” Processes: Advanced ashable hard mask Wall / Flash mount Primary user: Interface flat panel Right load lock pump Express: Load lock pump Atmospheric robot: Friction end effector Mounting: Light tower audio buzzer Options: Third FOUP FOUP RF ID Reader (3) FOUP RF10 reader FA Communication interface Advanced AHM Deposition kit EBR Capable load lock Pressure display package Heated process manometer Leak check shut off valve IMM Readiness option over left load lock 2007 vintage.
LAM RESEARCH / NOVELLUS Concept 3 Vector Express is a high-performance batch reactor equipment that provides unparalleled process control and uniformity in the production of wafers. The system has an automated interface which allows the user to easily set up and modify settings as process requirements change. It is equipped with multiple chamber and filament heating functions, which provides for precision control of process temperatures and significantly increased wafer yield and uniformity. The Vector Express is designed with a precision-controlled heating and cooling architecture that provides accurate and repeatable discharges and etches. The unit has a unique, rectangular chamber with integrated Plasma Enhanced Chemical Vapor Deposition (PECVD) capabilities that enable layer-by-layer wafer buildup with minimal thermal damage. It utilizes a combination of high frequency power and time-of-flight mass spectrometry to reliably adjust wafer film properties. This unique reactor allows for high throughput with batch processes that can run for up to seven days without any interruptions. It also utilizes multiple gas cabinets that enable exhaust filtration to ensure the highest quality results. The Vector Express has an efficient exhaust machine that minimizes particle loss from the wafer surface by using a combination of pressure and temperature measurements. The tool also includes several safety and monitoring features that help prevent any potential contamination or structural issues. These features include optical alignment verification, a leak monitoring asset for any release of flammable gases, and a temperature monitoring model that maintains the uniformity of the wafer's surface temperature. Overall, NOVELLUS Concept 3 Vector Express is a reliable, high-performing reactor that provides process control and uniformity, high throughput, precise wafer buildup, and enhanced safety and monitoring features. It utilizes advanced technology that enables users to accurately control temperatures and etches, and quickly produce repeatable results. By relying on the Vector Express, production lines can increase process yields and lower costs.
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