Used LAM RESEARCH / NOVELLUS Concept 3 Vector Express #9257029 for sale
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ID: 9257029
Wafer Size: 12"
Vintage: 2007
System, 12"
Process: Advanced ashable hard mask
Interconnect cable length: 75 Feet
Primary user: Interface flat panel
Right load lock pump
Express load lock pump
Light tower audio buzzer
Wall / Flash mount
Atmospheric robot: Friction end effector
Options:
Signal tower
IMM Readiness option over left load lock
Third FOUP
(3) FOUP RF ID readers
FA Communication interface
Advanced AHM deposition kit
EBR Capable load lock
Pressure display
Heated process manometer
Leak check shut off valve
No HDD
2007 vintage.
LAM RESEARCH / NOVELLUS Concept 3 Vector Express is a resistive etch reactor used for high precision applications. This advanced tool offers superior control over etch parameters, allowing for finer etched geometries even with complex designs. The Vector Express features a 250 mm wafer capacity, capable of running at high throughput rates. Furthermore, it is configured with an Endurium™ bonding equipment which provides a highly reliable process connection between the wafer and the vacuum chuck. The vector express is equipped with a customizable robot arm which allows for precise positioning for the etching process. This robot arm is coupled with the endurium™ bonding system and can move a maximum of 30 mm in X, Y, and Z axes. The tool also offers a 3D scan head which can easily sense the wafer shape and adjust the etch profile accordingly. The Vector Express has an integrated control unit which allows users to program the etching process in multiple steps, allowing for fine-tuned accuracy and process control. Moreover, its integrated dual (plasma and bias) source and dual RF generators enable users to etch very complex three-dimensional patterns with very small line widths and corner tunability without affecting the isotropic etch characteristics. The machine also offers good process repeatability. This is possible due to its two additional chambers that have been added which serve as purging and exhaust chambers. This helps to reduce chamber contamination and increases process stability over time. These additional features combined with its versatile source configurations provides users with superior performance and process flexibility. Additionally, its compact design and powerful performance make the Vector Express ideal for precision etch processes and applications.
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