Used LAM RESEARCH / NOVELLUS Concept 3 Vector Express #9257029 for sale

ID: 9257029
Wafer Size: 12"
Vintage: 2007
System, 12" Process: Advanced ashable hard mask Interconnect cable length: 75 Feet Primary user: Interface flat panel Right load lock pump Express load lock pump Light tower audio buzzer Wall / Flash mount Atmospheric robot: Friction end effector Options: Signal tower IMM Readiness option over left load lock Third FOUP (3) FOUP RF ID readers FA Communication interface Advanced AHM deposition kit EBR Capable load lock Pressure display Heated process manometer Leak check shut off valve No HDD 2007 vintage.
LAM RESEARCH / NOVELLUS Concept 3 Vector Express is a resistive etch reactor used for high precision applications. This advanced tool offers superior control over etch parameters, allowing for finer etched geometries even with complex designs. The Vector Express features a 250 mm wafer capacity, capable of running at high throughput rates. Furthermore, it is configured with an Endurium™ bonding equipment which provides a highly reliable process connection between the wafer and the vacuum chuck. The vector express is equipped with a customizable robot arm which allows for precise positioning for the etching process. This robot arm is coupled with the endurium™ bonding system and can move a maximum of 30 mm in X, Y, and Z axes. The tool also offers a 3D scan head which can easily sense the wafer shape and adjust the etch profile accordingly. The Vector Express has an integrated control unit which allows users to program the etching process in multiple steps, allowing for fine-tuned accuracy and process control. Moreover, its integrated dual (plasma and bias) source and dual RF generators enable users to etch very complex three-dimensional patterns with very small line widths and corner tunability without affecting the isotropic etch characteristics. The machine also offers good process repeatability. This is possible due to its two additional chambers that have been added which serve as purging and exhaust chambers. This helps to reduce chamber contamination and increases process stability over time. These additional features combined with its versatile source configurations provides users with superior performance and process flexibility. Additionally, its compact design and powerful performance make the Vector Express ideal for precision etch processes and applications.
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