Used LAM RESEARCH / NOVELLUS Concept 3 Vector Express #9281507 for sale

LAM RESEARCH / NOVELLUS Concept 3 Vector Express is a highly advanced reactor specifically designed to deposit layers of dielectric materials onto semiconductor wafers. This innovative design offers a high throughput with consistent uniformity, enabling it to meet the most demanding production requirements. The Vector Express features a two-stage plasma reactor with two distinct regions. The first region is a high vacuum region that can be operated at both low and high power levels. The high power level in this chamber allows for a greater rate of deposition and uniformity of material deposition. The second region is a low vacuum region, designed to minimize contamination and provide control of uniformity. The third region in the Vector Express is the exhaust region, designed to completely isolate the wafers during processing and to help remove any unwanted particles and gases from the system. The Vector Express reactor is composed of four main components: a pre-heater/post-annealer chamber, a bias sputter, an electron cyclotron resonance chamber, and a vacuum vacuum chamber. The pre-heater/post-annealer chamber uses infrared lamps and hot nitrogen gas to heat the wafer before and after the bias sputter process, respectively. The bias sputter chamber is equipped with an electrostatic field that bombards the wafer at a low-power level, allowing for deposition of precise and uniform layers of material. The electron cyclotron resonance chamber utilizes high frequency radio waves to excite the atoms in the ambient gas to produce a plasma environment that can be used to deposit dielectric materials with exceptional polarization properties. Finally, the vacuum chamber is used to provide an extremely clean environment for the entire process, ensuring minimal contamination of the deposited material. NOVELLUS Concept 3 Vector Express from NOVELLUS is a revolutionary reactor that can provide rapid and precise deposition of dielectrics on semiconductor wafers. This advanced design drastically reduces the time and resources needed to produce reliable chipsets with high uniformity. The Vector Express is capable of operating at both low and high power levels, allowing for more efficient deposition rates and higher uniformity of deposited material, enabling the reactor to meet the most demanding production requirements. By utilizing an electrostatic field, radio frequency waves, and a clean environment, the Vector Express is able to provide highly uniform deposition of materials, allowing for the production of reliable, high-performance chipsets.