Used LAM RESEARCH / NOVELLUS Concept 3 Vector Express #9294929 for sale
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ID: 9294929
CVD System, 12"
Process: PESiN
VAT 075 Slit valve
VAT Pendulum valve
Signal tower
MC3 Module controller
EMO
Host interface: SECS
LCD Monitor, 12"
Process module:
Chamber body
Chamber process: PESION
Process clean type: RPC
BROOKS AUTOMATION Fixload 6M Pod loader
MC3 Module controller
SMC Load lock slit valve
C2027-D01 Trust controller
VAT Pendulum pressure control valve
VAT 075 ATM Load lock valve
AX7645 RPC Generator
Servo spindle lift
ADVANCED ENERGY APEX-5513 HF Generator
CLX2500 LF Generator
Navigator 10013 RF Match
LTM Assembly, P/N: 02-169180-01 Rev E
RF Interface B/D, P/N: 26-164535-00
Chamber gas box:
MFC Number / Name / Size / Make / Model
MFC 1 / SiH4 / 1.5 SLM / BROOKS AUTOMATION / 6256S
MFC 2 / N2O / 10 SLM / BROOKS AUTOMATION / 6256S
MFC 5 / He / 20 SLM / BROOKS AUTOMATION / 6256S
MFC 6 / NH3 / 1 SLM / BROOKS AUTOMATION / 6256S
MFC 7 / N2O / 25 SLM / BROOKS AUTOMATION / 6256S
MFC 8 / O2 / 30 SLM / BROOKS AUTOMATION / 6256S
MFC 9 / NF3 / 10 SLM / BROOKS AUTOMATION / 6256S
MFC A / N2O / 1.5 SLM / BROOKS AUTOMATION / 6256S
MFC C / Ar / 10 SLM / BROOKS AUTOMATION / 6256S
MFC D / N2 / 10 SLM / BROOKS AUTOMATION / 6256S
Missing parts:
Load lock dry pump
Turbo molecular dry pump
Module dry pump
UPS Power: 120 V, 3 Phase, 3-Wires
Power supply: 208 V, 3 Phase, 5-Wires
2005 vintage.
LAM RESEARCH / NOVELLUS Concept 3 Vector Express is a revolutionary plasma processing reactor designed to increase capacity and throughput for semiconductor device fabrication. The Vector Express reactor uses an innovative architecture to maximize the performance of complex production tasks. It utilizes four independent plasma tubes, each capable of delivering high-power plasma equal to that of a full-scale plasma etch chamber. These plasma tubes are integrated into a cutting-edge design that buffers the processes, allowing for more efficient event timing, improved cycle times, and minimal maintenance. Additionally, Vector Express features an on-board gas manifold that directly supplies the plasma source with inert and reactive gases. This feature enables more precise process parameters and enables a much longer operating time, resulting in higher throughput and better repeatability. The Vector Express also features an extremely rugged and reliable susceptor plate, which is capable of withstanding thermal shock during post-process cooling, as well as offering a superior uniformity of uniformity of etch results. Lastly, this reactor is equipped with a new, revolutionary system for controlling pressure, which works to ensure that the chamber is always operating under optimal pressure environments, leading to higher yields and improved product quality. NOVELLUS Concept 3 Vector Express ensures a reliable, high-performance plasma processing solution for semiconductor device fabrication.
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