Used LAM RESEARCH / NOVELLUS Concept 3 Vector Sequel #9410421 for sale

LAM RESEARCH / NOVELLUS Concept 3 Vector Sequel is an advanced deposition reactor designed to provide precise and efficient thin film layer deposition of high performance materials. NOVELLUS Concept 3 Vector Sequel is the latest in a series of reactor designs that use the proprietary Vector Sequel technology developed by NOVELLUS. This technology is based on the principle of vector flow deposition, whereby a controlled combination of deposition gases, vaporized source materials and substrate input is used to create a layer of highly uniform and precise thin film materials. The mechanical design of LAM RESEARCH Concept 3 Vector Sequel is a modular, open-format that allows for fast and easy reconfiguration and maintenance. It features a deposition chamber for creating multiple process chambers and a variety of process tools that can be integrated with the chamber. These tools are made up of a mass flow controller, reactive switch, dual reaction manifold, and a PID controller. Concept 3 Vector Sequel also utilizes a specialized computer based user interface (GUI), which is used to show and control the operational parameters of the reactor. LAM RESEARCH / NOVELLUS Concept 3 Vector Sequel is designed to offer a wide range of process parameters that can be used to customize the deposition process to various applications. This includes the ability to modify the material deposition rate, temperature and pressure of the process, as well as the ability to set exposure and dwell times for optimal thin film layer deposition. The overall flexibility of NOVELLUS Concept 3 Vector Sequel reactor allows for the deposition of a wide range of materials, including oxides, salts, and metals. LAM RESEARCH Concept 3 Vector Sequel also includes a number of other advanced features, such as a high-temperature option, chamber cleaning options, and an equilibrated gas supply with both inline and in-situ gas analyzers for the monitoring of process conditions. With its combination of advanced deposition technology, high-end materials and process flexibility, Concept 3 Vector Sequel is a powerful and versatile tool for the deposition of thin film layers. In conclusion, LAM RESEARCH / NOVELLUS Concept 3 Vector Sequel is a versatile deposition reactor that offers a variety of processing options designed to optimize thin film deposition. Its modular design, advanced process tools and user-friendly computer interface make it an attractive solution for a variety of thin film deposition needs. With its efficient performance, wide range of materials, and precision control, NOVELLUS Concept 3 Vector Sequel is an ideal deposition tool for both research and production environments.