Used LAM RESEARCH / NOVELLUS Concept 3 Vector #9261720 for sale

ID: 9261720
Vintage: 2005
CVD System 2005 vintage.
LAM RESEARCH / NOVELLUS Concept 3 Vector is a type of reactor, designed to handle various process applications such as chemical vapor deposition (CVD) and atomic layer deposition (ALD). This advanced CVD/ALD reactor features a three-zone thermal environment, providing the ability to tailor process conditions with three heating and cooling plates. NOVELLUS Concept 3 Vector is designed with a low-pressure plasma source, featuring a 13.56 MHz inductively-coupled plasma (ICP) configuration. This allows for uniform plasma generation and low ultra-violet radiation for improved process repeatability with consistent particle size and deposition composition. LAM RESEARCH Concept 3 Vector enables fast process chamber evacuation, reducing the time required for process cycle and reducing roughness of films. Furthermore, Concept 3 Vector has a superior reaction gas distribution system, providing superior quality films through uniform reaction gas transport. LAM RESEARCH / NOVELLUS Concept 3 Vector is also designed with an ultra-low oxidation system. It utilizes a triple-layer coil for oxide-reducing performance and low cost of ownership. Moreover, NOVELLUS Concept 3 Vector is engineered with advanced thermoelectric modules, ensuring fast target temperature zones and matching temperature with repeatability and accuracy. LAM RESEARCH Concept 3 Vector's programmable logic controllers (PLCs) provide high-performance process control, allowing for accurate and repeatable process recipes. Its exceptional design makes Concept 3 Vector an ideal option for the processing of materials such as photovoltaic solar cells, thin film transistors, and gate dielectrics. LAM RESEARCH / NOVELLUS Concept 3 Vector offers outstanding film uniformity while still providing fast processing time and superior process repeatability. Its revolutionary design also makes it a great option for ultra-high-density memories, micro-electromechanical systems (MEMS) foundry, and BiCMOS wafers. With its exceptional features, NOVELLUS Concept 3 Vector provides improved device performance and improved production yields. Its consequent end-user benefits make LAM RESEARCH Concept 3 Vector an effective reactor for various fabrication processes.
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