Used LAM RESEARCH / NOVELLUS Concept 3 Vector #9261722 for sale

LAM RESEARCH / NOVELLUS Concept 3 Vector (C3V) is an industry-leading plasma reactor technology designed to produce high-quality reactive ions for use in semiconductor device fabrication. This technology is capable of producing highly energetic ions at high deposition rates, enabling ultra-high deposition uniformity over large areas. The C3V reactor consists of a horseshoe-shaped main chamber surrounded by a series of circular grids and channels. In the center of the main chamber is an annular cathode where an electric field is applied. Ions are produced in this electric field by the impact of a neutral gas, such as argon, on the cathode. These ions are then steered through one of the circular grids and directed through a series of pulsed fields of varying strength and length. This orchestrated sequence of pulse fields allows the C3V reactor to generate a highly energetic ion beam in an extremely uniform manner. In order to maximize its performance, the C3V reactor is equipped with a cooling system that helps remove heat generated by the electric field, as well as an automatic pressure regulation system that maintains uniform process conditions throughout the entire chamber. Additionally, the C3V features multiple independent detection systems that measure the energy, species, and intensity of the ion beam in real time, in order to ensure deposition uniformity and repeatability. Besides its high performance capabilities, C3V is easy to maintain and operate, making it an excellent choice for a wide range of fabrication applications. The reactor's advanced control system also allows for remote monitoring and control, and all operation parameters can be adjusted for optimal process performance. Overall, the C3V runs efficiently and reliably, delivering large area deposition uniformity, yields, and life cycle performance with high yields. The C3V reactor is the industry-leading solution for many semiconductor fabrication processes.