Used LAM RESEARCH / NOVELLUS Concept 3 Vector #9375284 for sale

LAM RESEARCH / NOVELLUS Concept 3 Vector
ID: 9375284
Wafer Size: 12"
System, 12".
LAM RESEARCH / NOVELLUS Concept 3 Vector is a plasma enhanced chemical vapor deposition reactor designed for the global semiconductor fabrication industry. It is built to meet the most exacting demands of advanced technology nodes, providing unequalled performance. NOVELLUS Concept 3 Vector incorporates a unique high aspect ratio showerhead and Etch Tube architecture, enabling it to process the smallest possible feature geometries with excellent throughput. The engineered uniformity and advanced chamber design provide a high degree of repeatability, allowing customers to reduce end product defect rates and streamline their production needs. LAM RESEARCH Concept 3 Vector utilizes a flexible RF power supply with comprehensive power control, pendant, off-gas fractionalization and pre-seeding capabilities. It provides unmatched versatility and can be configure to work with a variety of chambers, chamber sizes, and substrate materials. Concept 3 Vector is designed to meet the highest process temperature and temperature uniformity requirement of today's advanced technology nodes. It also includes advanced cooling technologies that allow for tight process control, ensuring the highest product quality and yields. LAM RESEARCH / NOVELLUS Concept 3 Vector also offers an extensive gas flow flexibility. With its comprehensive gas line and distribution technology, the Vector can precisely manage each film-forming precursor and require support gases, making it easy to adjust to a wide range of processes. Finally, NOVELLUS Concept 3 Vector features comprehensive diagnostics and embedded tools allowing users to optimize their processes at the highest levels of control, accuracy, and consistency. From gas line control and temperature profiling to process optimization and predictive maintenance features, LAM RESEARCH Concept 3 Vector provides customers with the tools they need to push the boundaries of innovation.
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