Used LAM RESEARCH / NOVELLUS CONCEPT ONE #9079785 for sale

LAM RESEARCH / NOVELLUS CONCEPT ONE is a global co-branded reactor developed by NOVELLUS and LAM RESEARCH Systems. It is a 300mm (12-inch) advanced step-and-repeat equipment, designed for high-productivity, precision etch applications in the microlithography sector, such as in semiconductor device manufacturing. NOVELLUS CONCEPT ONE uses a high-speed, high-temperature, remote plasma source which is moveable across the entire substrate surface. This allows for high accuracy patterning and etch characteristics, with fast process times. The high-precision independent chuck mechanism enables complex patterning, and the air bearing components deliver superior motion without degradation of part performance due to heat cycles. LAM RESEARCH CONCEPT ONE is outfitted with a variety of accessories that make the system suitable for different etch applications. First, the cooling systems include a high-capacity liquid-nitrogen subsystem to cool wafers and electrodes. This provides precise temperature control and excellent uniformity. Second, the unit is equipped with 'doped-oxide' RF generators, which generate a uniform electric field in the plasma for precise controlling etch process parameters. Third, the optical systems includes high-resolution cameras for aligning the target pattern on the substrate with a high degree of accuracy. CONCEPT ONE also boasts a set of on-board metrology tools, to measure etch process performance in real-time. These include a live laser scanner, edge-profile monitor, and defect detector to assess the effectiveness of the etch process and raise any issues, such as pattern fidelity, in-die etch profile, etch rate, etc. In addition, LAM RESEARCH / NOVELLUS CONCEPT ONE is outfitted with a suite of monitoring functions, which provide on-board visual and audio signals to alert operators to potential process problems. NOVELLUS CONCEPT ONE provides users with an advanced, turn-key etch and lithography solution tailored for their specific meeting and etch application needs. Its automated process control software takes care of all the parameters and monitors the etch process, ensuring optimal execution, improved yield and reliability, and minimized downtime. Overall, LAM RESEARCH CONCEPT ONE is an advanced, robust and highly reliable etching machine that is suitable for a broad range of etch and lithography applications. Its array of on-board metrology tools, automated process control software, highly accurate patterning, temperature control and independent chuck mechanism make it an ideal solution for high-productivity, precision etch applications in the microlithography sector.