Used LAM RESEARCH / NOVELLUS CONCEPT ONE #9364618 for sale

LAM RESEARCH / NOVELLUS CONCEPT ONE
ID: 9364618
Wafer Size: 2"-6"
PECVD System, 2"-6".
LAM RESEARCH / NOVELLUS CONCEPT ONE is a multi-zone, high-performance batch reactor designed to meet a variety of thin film deposition and process requirements. NOVELLUS CONCEPT ONE is built on a robust platform that provides repeatable uniformity and accurate material flow control. It is comprised of several integrated components including a process chamber, wafer transfer robot and a control equipment. The process chamber is designed to contain and circulate the process gases within a sealed reaction zone to provide better film uniformity. The chamber is further equipped with a top-hinged door allowing easy access for maintenance and servicing. The wafer transfer robot transports semiconductor wafers throughout the process chamber in an automated fashion to minimize exposure time to hazardous gases while also ensuring accurate film deposition over each wafer. The control system is a fully integrated suite of software and hardware components designed to monitor and control every aspect of the process. It can be programmed to automatically adjust parameters to optimize film uniformity, throughput and reproducibility. LAM RESEARCH CONCEPT ONE provides all the features necessary for achieving high-quality, high-throughput thin film deposition. The process chamber is equipped with a high-pressure gas distribution unit that enables effective mixing of deposition gases and enhanced film uniformity. It utilizes a heated susceptor-style wafer-handling machine to reduce interface contamination and improve substrate adhesion. All components are integrated with the control tool that automatically acclimates temperature, gas flow and pressure for each layer deposited. The closed-loop, multiple-zone batch reactor allows for precise control of the process conditions, thus allowing for optimal film properties from wafer to wafer. Additionally, the asset can be easily adapted for other process applications such as etching, nanostructuring and photonic device fabrication. CONCEPT ONE offers a reliable, user-friendly and efficient solution for many thin film deposition processes. Its cutting-edge features, uniformity and repeatability make it an ideal choice for any company looking to outsource thin film depositions.
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