Used LAM RESEARCH / NOVELLUS EFX MOD C for Concept 3 Altus #293625749 for sale

LAM RESEARCH / NOVELLUS EFX MOD C for Concept 3 Altus is a high-precision, versatile etch reactor designed for use in semiconductor manufacturing. The EFX Mod C's advanced features provide efficient and repeatable control of etching chemistry and process parameters. It is designed with a state-of-the-art, high-throughput, direct-driven, multi-zone chamber to minimize etch-rate variation and eliminate mask spiking. The multi-zone chamber has three longitudinal and two transverse zones, all of which can be configured independently. A dual-source gas delivery equipment, combined with adjustable makeup gas levels, provides the ability to control and fine tune the plasma etch process. A distributed electrostatic chuck creates a uniform field throughout the end to ensure uniform etching. The EFX Mod C is designed with a power delivery system that allows for greater process flexibility and control. This is achieved through a patented frequency-switching method, which enables process control and management of the etch rate variability. The chamber is also designed with an advanced cooling unit, which allows the use of high-temperature etch processes with minimum thermal damage to the substrate. By carefully controlling the pressure, flow rate, and temperature of the cooling gas, the aluminum substrates remain undamaged and the silicon remains uniformly patterned. The EFX Mod C supports the use of both chlorine- and fluorine-based etching chemistries. By allowing the user to control the relative chemistry levels and etch rates, the EFX Mod C enables a wide range of process parameters to be controlled and monitored. The EFX Mod C is a powerful tool for controlling precise etching processes in the advanced semiconductor device fabrication industry. With its dual-source gas delivery machine, adjustable makeup gas levels, distributed electrostatic chuck, and advanced cooling tool, it provides users with control and predictability needed to produce high-quality results. The EFX Mod C has earned its place as an industry-leading etching reactor, offering users improved etch-rate accuracy, reduced thermal damage, and greater process flexibility.