Used LAM RESEARCH / NOVELLUS Sabre XT 200 #293825088 for sale

ID: 293825088
Wafer Size: 8"
Electro copper plating system, 8" Cu plating system Wafer type: Notch (2) Cassettes (4) Power supplies (3) Cells 26-Slots EBR SMIF-POD Wafer transport: Dry robot Plating cleaning: (3) PEM Dry in / dry out Backside cleaning PEM and cell unit: PVDF Chemical supply pump: 6~12L Monitoring with a flow meter Lifting and rotating mechanism EBR adjustment range: 2mm (max) EBR and backside cleaning mixture: H2SO4 / H2O2 Chemical analyzer Heater and chiller unit Temperature control Closed loop.
LAM RESEARCH / NOVELLUS Sabre XT 200 is a cutting-edge reactor equipment designed for advanced semiconductor manufacturing processes. This high-performance tool offers superior process control, excellent uniformity, and enhanced productivity, making it an ideal solution for the most demanding semiconductor fabrication applications. Featuring a compact footprint and a modular design, NOVELLUS Sabre XT 200 enables seamless integration into existing manufacturing environments while allowing for future scalability and flexibility. The system is equipped with advanced automation capabilities, providing increased throughput and improved process repeatability. These features make LAM RESEARCH Sabre XT 200 a cost-effective and versatile solution for semiconductor manufacturers looking to maximize their production efficiency. One of the key strengths of Sabre XT 200 is its superior process control capabilities. The unit is equipped with advanced monitoring and control features that ensure precise control over critical process parameters, such as temperature, pressure, and gas flow rates. This level of control allows for the optimization of deposition and etching processes, resulting in higher product yields and improved device performance. LAM RESEARCH / NOVELLUS Sabre XT 200 also offers excellent process uniformity across the wafer, ensuring consistent device characteristics and performance throughout the production run. This uniformity is achieved through the machine's innovative process chamber design, which promotes efficient gas distribution and minimizes edge effects. As a result, manufacturers can achieve higher yields and improve the overall quality of their semiconductor devices. Furthermore, NOVELLUS Sabre XT 200 is designed to enhance productivity and reduce cycle times in semiconductor manufacturing processes. The tool's high-speed wafer handling capabilities, coupled with its advanced process control features, enable faster processing times and increased throughput. This allows manufacturers to meet their production targets more efficiently and improve their overall manufacturing efficiency. LAM RESEARCH Sabre XT 200 is also equipped with a range of safety and reliability features to ensure smooth and trouble-free operation. The asset incorporates robust monitoring and diagnostic tools that allow for proactive maintenance and troubleshooting, minimizing downtime and maximizing tool uptime. Additionally, Sabre XT 200 complies with industry standards for safety and environmental protection, making it a dependable and compliant choice for semiconductor manufacturing facilities. Overall, LAM RESEARCH / NOVELLUS Sabre XT 200 reactor model is a state-of-the-art tool that offers exceptional performance, reliability, and versatility for semiconductor manufacturing processes. With its advanced process control capabilities, excellent uniformity, and high productivity, NOVELLUS Sabre XT 200 is a valuable asset for semiconductor manufacturers looking to stay ahead in today's competitive market.
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