Used LAM RESEARCH / NOVELLUS SABRE XT #293610192 for sale
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LAM RESEARCH / NOVELLUS SABRE XT reactor is a high-precision, low-pressure plasma processing equipment designed for advanced semiconductor fabrication processes. By using radio-frequency plasma and elevated substrate temperatures, this reactor is capable of performing surface modification and etch processes. NOVELLUS SABRE XT reactor is built on a production-class platform and is equipped with proprietary RF source technology, enabling excellent process repeatability and control as well as improved plasma uniformity. It achieves excellent surface quality and sub-angstrom control over etch processes. The substrate is heated by a quartz heater plate that is capable of reaching temperatures up to 1000°C. The process gases are introduced into the etch chamber through an in-line gas box. The gas box lines are connected to GGA (Gas Gauge Assembly) with gas flowmeters, isolation valves, and quick-connect fittings for easy maintenance. The reactor is designed for batch processing and can process up to four substrates simultaneously. LAM RESEARCH SABRE XT is also equipped with a low-maintenance load lock and cassette handler, as well as a temperature-controlled process gases distribution box. The system also has a sophisticated automated control unit for monitoring the process parameters, enabling faster processing times, higher yields, and increased process repeatability and stability. The machine's advanced performance, control, and processing consistency make SABRE XT reactor a cost-effective and reliable etch solution for advanced semiconductor production. Its low-pressure plasma source, quartz heater plate, uniform temperature distribution, and in-line gas handling make it an ideal choice for nano-scale device fabrication.
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