Used LAM RESEARCH / NOVELLUS Vector Extreme #9293142 for sale
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ID: 9293142
Wafer Size: 12"
Vintage: 2008
CVD System, 12"
Power option: K-Model
Interconnect cable length: 22 m
Server type: DS/ EC
Process module options:
Process capability: HDR DB SiN / USG / SiN / ARL
ASTRON HF-S (15L) RPC Generator
RF Configuration: SiRF kit
Heated top plate: Passive
Hot chamber cover
APEX 5513 HF Generator
PDX 2500 LF Generator
ADVACED ENERGY Navigator HF Matcher
COMDEL LF Matcher, Two channel fixed matcher
Process manometer: Heated, 10 Torr
Hasting gauge pm
Hastings gauge foreline
(5) View ports
Spindle type: Servo
Pedestal option: Low profile
Minimum Contact Area (MCA): Pin, ball
Carrier ring: Standard
Pendulum valve: VAT
Lift pin: Servo type
Shower head, 13"
EIOC Configuration: Standard
IR EPD
Foreline type: Symmetric
Gas box configuration: Standard 12 channels
UI Option: Standard
UI Location: Right / Left
Signal tower
Front signal: Buzzer arm mount
Fascia color: Sky white
BROOKS AUTOMATION Reliance 9 ATM Robot
BROOKS AUTOMATION Mag 8 Vacuum robot
End effector: (2) Arms / Friction type
(4) FOUPs
BROOKS AUTOMATION / JENOPTIK Vision Load port
OMRON RFID Reader
Lamp
Ionizer kit
Light curtain option
Additional front end EMO
Load lock: Standard In / Out bound load lock
Filter Fan Unit (FFU) Option
Chase computer with cart
Throttle valve type: NORCAL
2008 vintage.
LAM RESEARCH / NOVELLUS Vector Extreme is a world-class etcher and asher for the semiconductor manufacturing industry. It is specifically designed to provide advanced precision and low defects for critical etch and ash operations. NOVELLUS Vector Extreme utilizes a revolutionary high-density dual source plasma processing technology to achieve improved control, lower particle generation, and higher throughput for back end of line etch applications. It also supports a broad range of etch chemistries to enable versatile process optimization and cost-efficient processing of advanced node devices. LAM RESEARCH VECTOR EXTREME etcher / asher offers maximum flexibility and scalability for various device structures and applications, while supporting a wide range of package formats, sizes, and sizes. It features a highly configurable 750mm platform and is capable of handling die sizes up to 3750mm2. Other key features include Dynamic-Etch Technology, an advanced physical modeling capability to optimize the etch process for DVD applications; Micron-Accuracy Leveling (MAL), a unique peak-and-valley trace height compensation technology for precise etch process control; and Expandable Wafer Changer (EWC), a modular work-handling system in a cohesive open architecture that maximizes process flexibility. Vector Extreme's lift-off etch capability is designed to minimize the need to move the wafer across the chuck during processing, while also reducing pressure variation across the wafer. Additionally, LAM RESEARCH / NOVELLUS VECTOR EXTREME includes advanced clean capabilities such as Advanced High Temperature Hydride CVD (AHT-CVD) to ensure maximum process stability and minimal particle generation. With robust process control features such as Active Process Monitoring (APM), Process Adapter Autotuning, and Extended Recipe Based Interfacing (ERBI), it ensures precise tuning with multiple targets for easy etch process optimization. NOVELLUS VECTOR EXTREME provides reliability and robustness, with a wide range of features to meet today's most demanding semiconductor device requirements. With its advanced technology, high-throughput, and configurability, LAM RESEARCH Vector Extreme is the perfect choice for all your etching and ashing needs in the semiconductor industry.
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