Used LAM RESEARCH / NOVELLUS Vector XT #293627660 for sale

LAM RESEARCH / NOVELLUS Vector XT is a high-performance, fully automated atmospheric-pressure plasma etch and deposition system designed for advanced 3D materials fabrication. NOVELLUS Vector XT offers the highest speed, highest accuracy and lowest gas consumption to enable high-yield, economical and sustainable processes. LAM RESEARCH Vector XT is a self-contained batch-processing tool that features an integrated gas/vacuum manifold, allowing simultaneous use of up to twelve process gases, permitting wide flexibility in fabrication requirements. Its modular design offers superior process control, providing users with reduced cost of ownership, high-throughput and repeatable processes. Vector XT reactor's vacuum chamber is a cylindrical stainless steel structure with a diameter of 10 inches. Its hermetic seal is maintained by a combination of manual latches and a low-pressure, nitrogen-filled purging solution. When the tool requires a new process gas, it can be loaded into the bottom of the chamber before being pumped out, enabling quick and efficient transitions. LAM RESEARCH / NOVELLUS Vector XT includes one of the fastest dual-axis "z-theta" manipulators (robotic arms) available for adjusting the substrate's angle, enabling fine-tuned control of the process. The on-board digital process control unit contains a range of dedicated and integrated hardware and software components that enable automated execution of etching and deposition processes. This can include temperature control, reactive gas rate control, RF power supply, pressure curves, gas sequencing, and gas composition. The dual-frequency RF power source is capable of delivering up to 450 watts, while the alternating pulsed DC power source offers up to 300 watts. Designed with a user-friendly interface, NOVELLUS Vector XT's operator terminal provides a range of functions, including set-up, process evaluation, data review, password protection and switching between manual and auto modes. Safety features are also plentiful, including proximity sensors, a lamp system and a pressure monitor. The lamps are configured to indicate chamber pressure, system status, gas detection and gas handling, ensuring operator safety. LAM RESEARCH Vector XT's chamber size is large enough for multiple substrates which can vary in sizes up to 450mm by 450mm by 300mm, making it suitable for wafer, PR substrates, MEMS devices and other complex substrates. Its proprietary nozzle geometry allows for uniformity and repeatability in etching and deposition processes with an impressive deposition rates of 20 Angstroms/second. In conclusion, Vector XT is a versatile and durable atmospheric-pressure plasma reactor suitable for a variety of etching and deposition processes. With its advanced features and capability to work with multiple substrates, LAM RESEARCH / NOVELLUS Vector XT offers users clean, repeatable results with reduced costs of ownership.