Used LAM RESEARCH / NOVELLUS Vector XT #293649597 for sale

LAM RESEARCH / NOVELLUS Vector XT Reactor is a multifunctional etch and deposition tool for semiconductor device manufacturing. It combines ultraviolet laser processing, direct-current plasma etching, high-density plasmas, and reactive gas deposition in a single tool to provide a comprehensive, automated processing solution. NOVELLUS Vector XT is a fully integrated platform that provides both system-level and chamber-level control, enabling complete in-situ process characterization and diagnostics. The ultraviolet laser processing capabilities of LAM RESEARCH Vector XT provide a high-precision beam that can precisely etch and deposit nanoscale structures with extremely low line width roughness. The laser can also be used to form submicron-sized slots with razor sharp precision and side-wall angles, as well as for rapid "black-mask" processing. By leveraging direct-current plasma etching, Vector XT enables users to create high-aspect-ratios, deep trenches, and features like peripheral shielding by leveraging advanced CCM techniques. This also eliminates the need for additional pre-etching steps, accelerating cycle time and reducing cost. LAM RESEARCH / NOVELLUS Vector XT also supports high-density plasma (HDP) for deposition of advanced metals, oxides, and dielectrics. These HDP processes cause minimal redeposition, which is necessary for depositing materials that exhibit poor adhesion onto surfaces. NOVELLUS Vector XT also supports reactive gas deposition to further enhance control of the film structure. This eliminates post-deposition treatments like cleaning, flush, curing, and conditioning, reducing total cycle time. To further refine its capabilities, LAM RESEARCH Vector XT integrates an array of diagnostics to address real-time challenges in-situ. It is equipped with an in-situ optical spectrometer that provides multi-wavelength analysis to assess etch rate, deposition rate, and materials characteristics. This provides feedback to continuously adjust the process parameters and achieve an optimal balance between yield, productivity, and device performance. Additionally, Vector XT also supports on-wafer RF metrology to monitor etch rate and accuracy in real-time. Overall, LAM RESEARCH / NOVELLUS Vector XT Reactor is an all-in-one multichamber tool for semiconductor device manufacturing. It offers precision nanoscale beam processing, high-aspect-ratio etch capabilities, high-density plasma deposition, and reactive gas deposition. NOVELLUS Vector XT also offers advanced diagnostics, including optical spectrometry and on-wafer RF monitoring, to ensure optimal process characterization and control. This combination of features provides a comprehensive solution for semiconductor device manufacturing.