Used LAM RESEARCH Sabre 3D #293620476 for sale

LAM RESEARCH Sabre 3D is an advanced reactor designed to enable breakthrough etch and deposition processes, enabling superior manufacturing capabilities across a variety of industries. It features two modular chamber options, which are capable of high-aspect ratio scaling as well as three-dimensional (3D) architectures. Sabre 3D also features an autodeposition process that enables low cost-of-ownership with minimal maintenance needs. With advanced hardware and software optimizations, the reactor ensures the high-quality performance, repeatability and reliability needed for both production-level and research-level applications. The key features of LAM RESEARCH Sabre 3D include its superior etch accuracy and overlap control, robust deposition speed and good uniformity, and versatile materials compatibility. Its time-to-market is further enhanced by its modular chamber options, autodeposition process, and advanced hardware/software optimization. For etch accuracy, the reactor leverages a novel RF-magnetic field and isotropic, symmetricised etching profiles for improved process repeatability. For deposition speed and uniformity, Sabre 3D allows for a high film growth rate and conformal films with outstanding planarization properties. The entire system is optimized for optimal usage, enabling excellent etch and deposition processes to be completed in a shorter amount of time with excellent uniformity. Furthermore, its hardware components are designed as one integrated unit, providing streamlined performance and ease-of-use. It leverages a three-gas injection capability, which results in a higher efficiency than two-gas systems. Additionally, LAM RESEARCH Sabre 3D features dynamic pressure and temperature control, allowing the reactor to operate across a wide range of operating settings while still obtaining the highest levels of precision and repeatability. From a materials compatibility perspective, Sabre 3D is perfectly suited to resist-based etching and deposition and is optimized for controlling critical dimensions (CD), feature uniformity, and film-on-film coverage. The reactor can also be used for other films, such as dielectrics, conductors, and insulators, making it suitable for a wide variety of applications. In summary, LAM RESEARCH Sabre 3D is an advanced reactor designed to enable breakthrough etch and deposition processes. It features two options of modular chambers and advanced hardware/software optimization with excellent etch accuracy and overlap control and high deposition speed and uniformity. Its excellent materials compatibility and dynamic pressure and temperature control allows the reactor to operate across a wide range of operating settings for highest levels of precision and repeatability, and its autodeposition process enables high speed-of-manufacturing with minimal maintenance needs.