Used LAM RESEARCH Sabre 3D #293811097 for sale

LAM RESEARCH Sabre 3D reactor is an advanced etch tool specifically designed for high-aspect-ratio fabrication in the semiconductor industry. This single-wafer system uses state-of-the-art electron-cyclotron-resonance (ECR) plasma technology to generate superior etching performance and optimize the etch rates of difficult materials. The performance of Sabre 3D reactor is significantly improved over conventional ECR systems due to the incorporation of an advanced 3D electrode within the reaction chamber. This design enables the user to obtain precise micromachining results with greater process control. LAM RESEARCH Sabre 3D reactor is built to facilitate fast prototyping and feature fabrication in deep-submicron technology nodes with high throughput. The ECR plasma source, combined with the integrated high frequency volumetric ECR sources, enables the user to etch a wide range of materials such as silicon, copper, aluminum, and others. The nitride passivation layer of Sabre 3D reactor is designed to enable rapid etching without compromising the integrity of the wafer, and the in-situ cleaning capabilities ensure minimal surface contamination or damage. The uniformity in the etch process can be further enhanced with the incorporation of advanced flow management techniques. This allows for uniformity over the entire wafer surface, which is important for process optimization and defect control. Additionally, LAM RESEARCH Sabre 3D reactor offers integrated gas delivery systems for easy process setup and improved process control. These systems enable precise parameter control for tailoring the etch process. The superior process control offered by Sabre 3D reactor, in combination with its high throughput rate, makes it an ideal choice for high-aspect-ratio fabrication. Its innovative three-dimensional electrode design provides uniformity in the etch process as well as reduced downtime due to its ability to keep the chamber clean. It is a flexible and powerful tool for deep-submicron fabrication and a reliable choice for industries requiring precise process control.